Computerized Langmuir Probe Measurements in a Capacitively Coupled RF Discharge

Abstract

A system of automated computerized Langmuir probe measurements is used in order to determine the plasma parameters in a plasma reactor constructed for cleaning of metallic artifacts by RF discharge. A compensated probe insures the suppression of the RF interference. The probe data are collected using a commercial data acquisition unit connected to a portable computer. The raw data are processed using wavelet transforms techniques which assures the de-noising of the probe signal without distortion of the probe I-V characteristic. The first and second derivatives of the I-V characteristic are determined. The measurement of the electron density spatial distribution in the inter-electrode distance indicates a flat density profile in the middle region of the discharge.