Cryogenic Characterization of FBK HD Near-UV Sensitive SiPMs

Abstract

We report on the characterization of near-ultraviolet high density silicon photomultiplier () developed at Fondazione Bruno Kessler () at cryogenic temperature. A dedicated setup was built to measure the primary dark noise and correlated noise of the \ between 40 and 300~K. Moreover, an analysis program and data acquisition system were developed to allow the precise characterization of these parameters, some of which can vary up to 7 orders of magnitude between room temperature and 40~K. We demonstrate that it is possible to operate the \ near-ultraviolet high density \ at temperatures lower than 100~K with a dark rate below 0.01 cps/mm2 and total correlated noise probability below 35\% at an over-voltage of 6~V. These results are relevant for the development of future cryogenic particle detectors using \ as photosensors.

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