Influence of magnetic field on plasma parameters and thin film deposition along axial and radial distances in DC magnetron

Abstract

Magnetic field (B) distribution of the magnetron was measured and discussed its effect on plasma parameters and deposition rate. Plasma parameters such as electron temperature (Te), electron number density (ne) were estimated using electron flux (EF) and electron energy distribution function (EEDF) methods as function of axial, radial distances from the cathode. Te and ne decreased with increasing of axial, radial distances from the cathode. Dr was obtained for the same positions where the above plasma parameters were measured, and found that similar profile with Te and ne. Magnetron configuration was simulated using COMSOL Multiphysics software and compared with the experimentally measured profile. Further, density distribution was simulated using measured B through particle in cell - Monte Carlo collision and found simulation results are well supported to the experimental results.