Precision beam telescope based on SOI pixel sensor technology for electrons in the energy range of sub-GeV to GeV
Abstract
We developed a beam telescope system comprising five layers of 300-μm-thick INTPIX4NA monolithic pixel sensors with each pixel size of 17 μm square. The sensors were fabricated using silicon-on-insulator (SOI) technology. The signal-to-noise ratio of 140--230 is realized at a bias voltage of 20~V. The tracker system was tested using a positron beam of 200--822 MeV/c, and various tracking methods are examined to optimize spatial precision achievable at these energies. The best tracking precision including the precision of the sensor under test itself is 11.04 0.10 μm for 822-MeV/c positrons for an equidistant sensor spacing of 32 mm. The achieved precision results combined with the intrinsic spatial resolution value obtained for a similar system using 120 GeV protons are used to estimate the tracking performance of electrons in the GeV energy range; a tracking precision of 2.22 μm is evaluated for 5-GeV electrons. The method to estimate the tracking performance is verified using a Geant4-based simulation. The developed high precision tracker system enables to map the detailed performance of the sensors with pixel sizes of O(10 μm), therefore will be a powerful system for development of devices targeting precision position resolutions.
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