Plasma double layer development during high power EUV exposure
Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov, Andrei M. Yakunin, Mark van de Kerkhof
Abstract
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures. It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF. Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.
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