Investigation of high pressure capacitively coupled plasmas produced by electrons energized in DC sheath at powered electrode

Abstract

A 13.56 MHz, capacitively coupled plasma is investigated experimentally to determine the power absorption mechanism across a wide pressure range ({\approx} 5 - 600 mTorr) at {\approx} 10 W. Axial profiles of plasma parameters are measured along with V_{DC}, the DC self-bias voltage on the powered electrode (PE), from which the DC sheath voltage drop, V_{s} is determined. Axial profiles of electron ohmic power absorption reveal that power deposition is highest in low-density regions and lowest in high-density regions, indicating that plasma formation is not driven by Ohmic heating. Probability arguments were correlated with locations of the density peaks to determine the ionization mean free paths (λ_{iz}) at each pressure. Electron acceleration and average electron velocity acquired in the DC sheath voltage drop at PE were also calculated to determine λ_{iz} independently for comparing with those calculated from the density profiles. The agreement is good for all pressures, barring the lowest pressure ({\approx} 5 mTorr) for which there is significant deviation. The electron sheath transit times are a small fraction of the RF period, implying that the accelerated electrons experience the RF field as instantaneous "spot values" superimposed on V_{s}, the DC sheath drop. The negative self-bias on PE renders the RF swing asymmetric making it negative for most of the cycle. Since the RF accelerates electrons when it is negative and takes energy from them when it is positive, net power is transferred to the electrons during the course of steady-state measurements, averaged over many RF cycles. Except at {\approx} 5 mTorr where stochastic heating dominates, the RF field at higher pressures exhibits a novel role, not hitherto reported.