TCAD Cryogenic Model Parameters Calibration based on 65 nm NMOS Experimental Data

Abstract

In this paper, 65 nm n-type Metal-Oxide-Semiconductor Field-Effect-Transistors (nMOSFETs) are taped out and measured at 292 K to 4.5 K. Technology Computer-Aided-Design (TCAD) model parameters are then calibrated to fit the simulation curves to experimental electrical curves. Transmission electron microscopy (TEM) is used to unveil the dimensions of the transistors to ensure accurate modeling. The experimental and simulation capacitance-voltage (CV) curves, drain current - gate voltage (IDVG) curves, and drain current - drain voltage (IDVD) curves are fitted well using the calibrated parameters. The major models calibrated are the Lucent model, which is comprised of an extended PhuMob model, Lombardi model for surface mobility, and the Hänsch high field mobility model. A band-tail model with adjusted band width is applied to fit the sub-threshold swings at all temperatures. The calibrated parameters are expected to be applicable to other technologies because TCAD models are not technology-specific. It is also found that, except for saturation velocity, no new temperature-dependent model is needed. The calibration process and fitting strategies are detailed and are expected to be applicable to calibrate other transistor types.