Fabrication-Aware Inverse Design of Nanophotonic Devices for 3D Laser-Nanoprinting
Oliver Kuster, Tim Alletzhäusser, Carsten Rockstuhl, Martin Wegener, Thomas Jebb Sturges
Abstract
Advances in 3D laser-nanoprinting enable us to fabricate 3D nanophotonic devices with a wide range of functionalities on demand. By exploiting all three spatial dimensions, an enormous design space becomes available for these nanophotonic devices. However, such an immense design space is impossible to explore efficiently by intuition alone, especially when designing free-form nanophotonic devices. Density- based topology optimization offers a natural tool for 3D nanophotonic design by allowing the efficient design of devices with millions of degrees of freedom. Traditional density-based topology optimization relies on heuristic measures to account for limitations imposed by the fabrication method. Indeed, the fabrication method is rarely considered as part of the forward model in the design pipeline. In this work, we introduce an inverse design method that explicitly models the direct-laser-writing process used in 3D nanoprinting. Incorporating a differentiable formulation of the direct-laser-writing model allows us to design 3D nanophotonic devices within the experimentally available design space and to precompensate for fabrication-specific effects. Optimizing inside the experimentally available design space ensures that the constraints we put on the optimization are given by our parametrization of the fabrication method and not by heuristic methods, which might over- or underconstrain the optimization problem. Furthermore, modeling the 3D laser-nanoprinting process explicitly allows us to not only take fabrication-specific effects, such as the proximity effect, into account but also enables the optimization to actively make use of these fabrication-specific effects to increase the functionality of the device.
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