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CompileMask: Bridging the Gap Between Expressiveness and Efficiency in Attention Masking

Hongzheng Li, Jiacheng Wan, Zhaolong Xing, Zhida Jiang, Yuanhang Yang, Junhua Shu, Jiaxing Wang, Xupeng Miao, Yingxia Shao, Zhen Chen, Ke Zhang

cs.DCarXiv:2610.13474

Abstract

Modern attention workloads require diverse masking patterns whose boundaries depend on runtime metadata, yet efficient attention kernels natively support only a small set of patterns. Existing methods for supporting custom masks in these kernels face an expressiveness-efficiency trade-off. Predicate-based methods are expressive but incur substantial preprocessing and execution overhead, whereas interval-based methods execute efficiently but restrict expressiveness through a predefined interval count. We present CompileMask, which addresses this trade-off by connecting expressive mask specifications with efficient attention execution. We design a compiler that analyzes visibility rules during the offline stage and generates a mask-specific preprocess kernel. We further propose MaskSpec, a region-based DSL that lets users express these rules. During the online stage, the generated kernel reads batch metadata and produces a compact Execution Descriptor that lets the attention kernel efficiently check visibility by comparing element indices against precomputed endpoints. Experiments show that CompileMask achieves up to 3.8× speedup over state-of-the-art methods.

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