Universal model of the growth of III-V tetrahedral semiconductors on polar surfaces: pyramids and glue atoms. VI. Surface diffusion on a nonmetal-terminated surface

Abstract

Ab initio calculations were used to simulate surface diffusion of adsorbates on the nonmetal-terminated surface of tetrahedral semiconductors: GaN, GaP, GaAs and GaSb. These surfaces are wurtzite gallium nitride, i.e. GaN(000-1) surface, zinc blende gallium phosphide, i.e. GaP(-1-1-1) gallium arsenide, GaAs (-1-1-1) and gallium antimonide GaSb (-1-1-1) surfaces. The mixed coverage consists of Ga adatoms in the first layer with a nonmetal atom attached above them forming a triangular-based pyramid. The pyramidal structures are stable during surface jumps involving rotations around one of the basal Ga adatoms. Thus, the diffusion proceeds via rotation (pivot) of the pair of the other basal Ga adatoms around an immobile Ga adatom moving them into new, originally empty sites. Using an energy-path determination procedure, the diffusion barriers were obtained as the difference between the initial site energy and the activated complex state energy. The detachment energy of the NM adatom was obtained assuming a final state in atomic and molecular form. The energy barrier for detachment to the atomic state is high for all atoms, on the order of 5 eV. For the molecular state these barriers are different: smaller for nitrogen, on the order of 1 eV, which is related to the high dissociation energy of the N2 molecule. For P and As the barrier is above 2 eV. For Sb it was not determined. Accordingly, the surface diffusion length is macroscopically large, indicating that all NM adatoms arrive at the steps.