Surfactants in semiconductor heteroepitaxy: Thermodynamics and/or kinetics?

Abstract

The effect of surfactants on the thermodynamics and kinetics of semiconductor heteroepitaxy is briefly discussed. It is argued that the way the surfactants suppress the thermodynamic driving force for 3D islanding depends on the mechanism of exchange of overlayer and surfactant atoms. If the overlayer atoms occupy bulk-like positions provided by the outgoing surfactant dimers, as is the case of Ge/Si(001), large atomic displacements are forcibly inhibited, and the wetting of the overlayer by the substrate becomes nearly complete. This complete wetting of the overlayer by the substrate means a zero thermodynamic driving force for 3D islanding. Once the thermodynamics do not require 3D islanding a change of the growth mode with the temperature should not be observed. Thus, the temperature change of the growth mode appears as an indication for the primary role of the kinetics, as in the case of Ge/Si(111).