Giant microwave photoresistance of two-dimensional electron gas
P. D. Ye, L. W. Engel, D. C. Tsui, J. A. Simmons, J. R. Wendt, G. A. Vawter, J. L. Reno
Abstract
We measure microwave frequency (4-40 GHz) photoresistance at low magnetic field B, in high mobility 2D electron gas samples, excited by signals applied to a transmission line fabricated on the sample surface. Oscillatory photoresistance vs B is observed. For excitation at the cyclotron resonance frequency, we find an unprecedented, giant relative photoresistance (ΔR)/R of up to 250 percent. The photoresistance is apparently proportional to the square root of applied power, and disappears as the temperature is increased.
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