Electrostatically Assembled Metallic Point Contacts

Abstract

We describe a method for creating atomic-scale electric contacts. A metal source is deposited on two insulating substrates separated by a 70 nm gap. Electric conductance across the gap is monitored, while protrusions from the bulk extend into the gap and reach corresponding protrusions on the other side of the gap. When the voltage across the gap is large, a pair of corresponding protrusions assembles into a point contact, via equilibrium between electrostatic attraction and a maximum sustained current. The current voltage characteristics of the point contact display crossover from weak link into tunneling junction when its conductance is near 2e2/h, indicating that the point contact is atomic-scale.