Nanolithography based on real-time electrically-controlled indentation with an atomic force microscope for nanocontacts elaboration
K. Bouzehouane, S. Fusil, M. Bibes, J. Carrey, T. Blon, P. Seneor, V. Cros, L. Vila
Abstract
We report on the fabrication of nanocontacts by indentation of an ultrathin insulating photoresist layer deposited on various types of conductive structures. A modified atomic force microscope (AFM) designed for local resistance measurements is used as a nanoindenter. The nanoindentation is performed while measuring continuously the resistance between the conductive tip of the AFM and the conductive layer, which is used as the trigger parameter to stop the indentation. This allows an extremely accurate control of the indentation process. The indented hole is subsequently filled by a metal to create a contact on the underlying layer. We show that nanocontacts in the range of 1 to 10 nm2 can be created with this technique.
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