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New cellular automaton designed to simulate epitaxial films growth

R. Kosturek, K. Malarz

cond-mat.mtrl-sciarXiv:cond-mat/0406677

Abstract

In this paper a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle-particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle-particle lateral bonds z and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent α and the growth exponent β are (0.863,0.357), (0.215,0.123), (0.101,0.0405) and (0.0718,0.0228) for z=1, 2, 3 and 4, respectively. Snapshots from simulations of the growth process are included.

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