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Kondo Effect in Electromigrated Gold Break Junctions

A. A. Houck, J. Labaziewicz, E. K. Chan, J. A. Folk, I. L. Chuang

cond-mat.mes-hallarXiv:cond-mat/0410752

Abstract

We present gate-dependent transport measurements of Kondo impurities in bare gold break junctions, generated with high yield using an electromigration process that is actively controlled. Thirty percent of measured devices show zero-bias conductance peaks. Temperature dependence suggests Kondo temperatures \~7K. The peak splitting in magnetic field is consistent with theoretical predictions for g=2, though in many devices the splitting is offset from 2guB by a fixed energy. The Kondo resonances observed here may be due to atomic-scale metallic grains formed during electromigration.

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