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Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters

T. David, S. Goldsmith, R. L. Boxman

cond-mat.mtrl-sciarXiv:cond-mat/0501374

Abstract

The micro-properties (structure and composition), and macro-properties (electrical and optical properties) of zinc oxide (ZnO) thin films deposited on glass substrates using a filtere vacuum arc deposition (FVAD) system were investigated as a function of oxygen pressure (0.37 - 0.5 Pa) and arc current (100 - 300 A). Correlations between the various properties were investigated.

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