RF Sputter Deposition of Epitaxial Nanocrystalline Nd1-xSrxCoO3 Thin Films
Lorenzo Malavasi, Eliana Quartarone, Carla Sanna, Nathascia Lampis, Alessandra Geddo Lehmann, Cristina Tealdi, Maria Cristina Mozzati, Giorgio Flor
Abstract
In this paper we report the deposition of epitaxial thin films of Nd1-xSrxCoO3 with x=0, 0.2 and 0.5 on single crystalline substrates (SrTiO3 and LaAlO3) carried out by means of rf-magnetron sputtering. The deposited films are all completely oriented and epitaxial and characterized by a nanocrystalline morphology. As-deposited films have an average roughness around 1 nm while after the thermal treatment this increases up to 20 nm while preserving the nanocrystalline morphology. All the films deposited on SrTiO3 have shown to be under a certain degree of tensile strain while those on the LaAlO3 experience a compressive strain thus suggesting that at about 50 nm the films are not fully relaxed, even after the thermal treatment. For the x=0.2 composition three different thickness have been investigated revealing an increased strain for the thinner films.
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