Clustering of phosphorus atoms in silicon

Abstract

To explain the effect of electron density saturation at high phosphorus concentrations the model of negatively charged phosphorus clusters was compared with the experimental data. A number of negatively charged clusters incorporating a point defect and phosphorus atoms were investigated at temperatures of 920 and 1000 Celsius degrees. It was established that for clusters incorporating more than one phosphorus atom calculated electron density reached a maximum value and then monotonically and slowly decreased with increasing the total dopant concentration. If the cluster incorporates 3-4 phosphorus atoms the calculated dependencies of carrier concentration agree well with the experimental data for both temperatures regardless of the negative charge state of the cluster (- or 2-). Moreover, for all investigated doubly negatively charged clusters the fitting parameter is independent on the temperature. It means that formation of doubly negatively charged clusters is most likely but it is difficult to choose between clusters incorporating two, three or four phosphorus atoms. From a good agreement of the calculated curves with the experiments it follows that the model based on the formation of negatively charged clusters can be used in simulation of high concentration phosphorus diffusion.