Series expansion and computer simulation studies of random sequential adsorption
Jian-Sheng Wang
Abstract
We discuss two important techniques, series expansion and Monte Carlo simulation, for random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed to a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some details various methods of computing the coverage theta(t) and present some of the recent and new results in random sequential adsorption.
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