Towards Ultra Scalability of Non-Volatile Magnetic Tunnel Junctions with a 3D Storage Layer

Abstract

The perpendicular Spin Transfer Torque Magnetic Random Access Memory is one of the most promising emerging non-volatile memory technologies, based on ultra-thin magnetic tunnel junctions. However, as these devices are limited by their thermal stability factor at technological nodes smaller than 20 nm, their scalability is compromised. A possible solution to this limitation relies on taking advantage of the shape anisotropy, by increasing substantially the thickness of the storage layer. Thanks to the combination of a vertical aspect-ratio and enhanced volume, high thermal stability can be maintained at sub-10 nm nodes. Here, we present the technological advancements and understanding of the magnetisation reversal that led to faster switching speeds at reduced switching voltage, providing a viable approach for dense arrays of ultra-small magnetic tunnel junctions.